Calculate accurate deposition rates for sputtering, evaporation, and CVD processes.
Process Parameters
Å (Angstroms)
nm (Nanometers)
µm (Microns)
Minutes
Seconds
Hours
Correction for sensor vs. substrate position (Default: 100%)
Calculated Rates
Standard Rate (Å/s)
0.00 Å/s
Rate in nm/min
0.00 nm/min
Rate in µm/hour
0.00 µm/h
Summary
Enter parameters to view summary.
function calculateDepositionRate() {
// Get Input Values
var thicknessInput = document.getElementById('measuredThickness').value;
var thicknessUnit = document.getElementById('thicknessUnit').value;
var timeInput = document.getElementById('depositionTime').value;
var timeUnit = document.getElementById('timeUnit').value;
var toolingFactor = document.getElementById('toolingFactor').value;
// Validation
if (thicknessInput === "" || timeInput === "" || toolingFactor === "") {
alert("Please enter all required fields (Thickness, Time, and Tooling Factor).");
return;
}
var thickness = parseFloat(thicknessInput);
var time = parseFloat(timeInput);
var tooling = parseFloat(toolingFactor);
if (isNaN(thickness) || isNaN(time) || isNaN(tooling) || time <= 0) {
alert("Please enter valid numeric values. Time must be greater than zero.");
return;
}
// Normalize Thickness to Angstroms (Å)
var thicknessInAngstroms = 0;
if (thicknessUnit === 'angstrom') {
thicknessInAngstroms = thickness;
} else if (thicknessUnit === 'nm') {
thicknessInAngstroms = thickness * 10;
} else if (thicknessUnit === 'um') {
thicknessInAngstroms = thickness * 10000;
}
// Normalize Time to Seconds (s)
var timeInSeconds = 0;
if (timeUnit === 'sec') {
timeInSeconds = time;
} else if (timeUnit === 'min') {
timeInSeconds = time * 60;
} else if (timeUnit === 'hour') {
timeInSeconds = time * 3600;
}
// Calculate Base Rate (Å/s)
var rawRate = thicknessInAngstroms / timeInSeconds;
// Apply Tooling Factor
// Tooling Factor acts as a multiplier. If the sensor reads 100%, and we are calculating FROM physical measurements
// normally Tooling Factor adjusts what the sensor sees vs what hits the substrate.
// In this calculator context (post-run calculation), we assume the user is calculating the EFFECTIVE rate
// on the substrate based on thickness measured on the substrate.
// However, if the user wants to know the "Source Rate" vs "Substrate Rate", the tooling factor is applied.
// Logic: Effective Rate = (Thickness / Time) * (Tooling / 100) is standard for forward calibration.
// Here, we treat 'Thickness' as the measured substrate thickness.
// If Tooling Factor Rate is 500nm/time. Tooling factor is usually 100 here.
// Use Case 2: "Sensor read 500nm, what is rate on substrate?" -> Apply tooling.
// We will interpret inputs as "Value read from Sensor/Thickness Monitor".
// Therefore: Substrate Rate = (Sensor Thickness / Time) * (Tooling / 100).
var finalRateAngstromsSec = rawRate * (tooling / 100);
// Convert to other units
// 1 nm = 10 Å
// 1 min = 60 s
var finalRateNmMin = (finalRateAngstromsSec / 10) * 60;
// 1 um = 10000 Å
// 1 hour = 3600 s
var finalRateUmHour = (finalRateAngstromsSec / 10000) * 3600;
// Update UI
document.getElementById('resAngstroms').innerHTML = finalRateAngstromsSec.toFixed(3) + ' Å/s';
document.getElementById('resNanometers').innerHTML = finalRateNmMin.toFixed(3) + ' nm/min';
document.getElementById('resMicrons').innerHTML = finalRateUmHour.toFixed(4) + ' µm/h';
var summaryText = "At " + tooling + "% tooling factor, a sensor reading of " + thickness + " " + thicknessUnit +
" over " + time + " " + timeUnit +
" results in a deposition rate of " + finalRateAngstromsSec.toFixed(2) + " Å/s.";
document.getElementById('resSummary').innerHTML = summaryText;
// Remove blur
document.getElementById('resultsArea').style.opacity = "1";
document.getElementById('resultsArea').style.filter = "none";
}
Understanding Deposition Rate in Thin Film Processes
In thin film engineering and materials science, calculating the deposition rate is a fundamental task for ensuring process control and film quality. Whether you are working with Physical Vapor Deposition (PVD) techniques like sputtering and thermal evaporation, or Chemical Vapor Deposition (CVD), knowing exactly how much material is being deposited per unit of time is critical for achieving precise film thickness.
Why Deposition Rate Matters
Film Structure: High rates can lead to amorphous structures, while slower rates might allow for better crystalline growth (epitaxy).
Process Economy: In industrial coating, faster deposition rates generally equal higher throughput and lower costs per unit.
Stress Control: The rate at which atoms land on the substrate affects the internal stress of the film, influencing adhesion and durability.
The Formula
The basic formula for deposition rate ($R$) is derived from the thickness ($T$) deposited over a specific duration of time ($t$):
R = (T / t) × (TF / 100)
Where:
R = Deposition Rate (typically Å/s or nm/min)
T = Measured Thickness (Å, nm, or µm)
t = Deposition Time (s, min, or h)
TF = Tooling Factor (percentage)
What is the Tooling Factor?
The Tooling Factor is a correction percentage used when the thickness monitor (usually a Quartz Crystal Microbalance or QCM) is located in a different geometric position than the substrates being coated.
Because the evaporant flux often follows a cosine distribution (in evaporation) or a specific plasma distribution (in sputtering), the sensor might receive more or less material than the substrate. A tooling factor of 100% means the sensor and substrate receive the exact same amount of material. If the substrate receives only 80% of what the sensor sees, the tooling factor is 80%.
Common Units of Measurement
Unit
Context
Å/s (Angstroms per second)
Standard for QCM controllers and very thin films (optical coatings, electronics).
nm/min (Nanometers per minute)
Common in sputtering processes and thicker optical films.
µm/h (Microns per hour)
Used for thick protective coatings, tribological films, or high-rate evaporation.